US SP3 installs advanced diamond deposition equipment for Heriot-Watt University

Abstract SP3 Diamond Technology Inc. (hereinafter referred to as SP3) is a leading global diamond film product, growth equipment and service provider. After selling a set of advanced 650 hot wire CVD diamond deposition equipment not long ago, SP3...

SP3 Diamond Technology Inc. (hereinafter referred to as SP3) is a leading global supplier of diamond film products, growth equipment and services. After selling an advanced 650 hot wire CVD diamond deposition facility not long ago, SP3 announced that it has installed the equipment at Heriot-Watt University in Edinburgh, Scotland. As part of the university's research, the device is being used to develop a technology that can withstand the enormous heat generated by nuclear fusion reactions. Heriot-Watt University plays an important role in the International Thermonuclear Experimental Reactor (ITER) program. The ITER program is a major international cooperation program in the world's scientific and technological community to solve the future energy problems of mankind. It has cost a total of 10 billion euros. Its goal is to develop nuclear energy that is pollution-free and has no impact on global warming.

Because diamonds have a unique ability to withstand the heat generated by next-generation nuclear reactors, Heriot-Watt University selected the diamond-coated substrate as the wall material for the reactor. In addition, the radiation resistance of diamond and its chemical stability in a hydrogen plasma environment are also important reasons why diamond is the material of choice.

"We believe that we are entering a new era in which diamond performance has been unearthed as never before, and that diamonds will be the best choice in more and more fields," said Dwain Aidala, Chairman and Chief Operating Officer of SP3, USA. The main reason for the adoption of the device is that it can deposit diamond film on a large area and at low cost. We have seen that the patented technology and core technology in the 650 type deposition equipment will make it a popular market for CVD diamond in more markets. Catalyst."

SP3's 650-type equipment can deposit high-grade polycrystalline diamond films over a wide range of low-cost substrates on a variety of substrate materials. The deposition thickness can be freely selected between 200 nm and 50 microns as needed. Chemical vapor deposition (CVD) processes deposit materials such as diamonds in areas up to 300 mm in diameter. Deposition products can be used as wear-resistant coatings, thermal management element substrates, amorphous silicon for solar cells, water treatment, and electrochemistry. Use electrodes, passivation layers for semiconductor chucks, cutting tools, and the like. (This article was compiled by Beijing Shibo Company)
 

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